-# File opened at 2012-08-10 09:58:51.833750
+# File opened at 2012-08-10 10:42:18.809705
# Accelerating Voltage = 38.5
# Focus Voltage = -0.136
# Deflection Voltage = 1.346
# Initial Voltage = Sweep
# Heating Current = 1.141
# Heating Voltage = 1.46
-# Chamber Pressure = 3.60e-8
-# 610B Zero = 0.00
+# Chamber Pressure = 3.85e-8
+# 610B Zero = 0.40
# 602 Zero = 0.00
-# 610B Scale = 1e-7 x 0.3
+# 610B Scale = 1e-7 x 0.03
# 602 Scale = 1e-5 x 0.3
# 602 0.1 Battery = 8.20
# 602 0.03 Battery = 7.65
# 602 0.003 Battery = 7.80
# 602 0.001 Battery = 8.20
# ADC Regulator = 3.30
-# Sample = None
-# Sample Angle = 318
-# Title = Current vary during sputtering process
-# Comment = Measure emission & sample current at fixed energy with sputtering filament on. Because why not?
+# Sample = Au on Si (60s 3.1A + 120 3.2A + 300s 3.5A ~1e-7mbar + 600s 3.5A 6e-8mbar)
+# Sample Angle = 136
+# Title = Au on Si (18min)
+# Comment = First Sample; Increased thickness. Sweeps.
# Data = time DAC ADC4 ADC4_sigma ADC5 ADC5_sigma
-# Parameters last checked = 2012-08-10 09:58:51.833497
-# File closed at 2012-08-10 09:58:51.834152
+# Parameters last checked = 2012-08-10 10:42:18.809457
+# File closed at 2012-08-10 10:42:18.810091