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%\title{\bf Characterisation of nanostructured thin films}
%\author{Sam Moore\\ School of Physics, University of Western Australia}
%\date{April 2012}
%\maketitle

\section{Ellipsometry}

\subsection{Description of Method}

Ellipsometry is a versatile optical technique commonly employed for determining the thickness of multilayered thin films \cite{}. In general, ellipsometry measures the parameters $\psi$ and $\Delta$, which are related to the complex Fresnel reflection coefficients $r_s$ and $r_p$:
\begin{align*}
	\tan \psi e^{i \Delta} &= \rho = \frac{r_p}{r_s}
\end{align*}
$r_s$ is the 


For a bulk substrate (the simplest possible sample), $r_s$ and $r_p$ may be directly related to the optical constants of the material:
\begin{align*}

\end{align*}

\emph{TODO: Multilayered thin films}.

\section{Variable Angle Spectroscopic Ellipsometry}

Traditional ellipsometers were limited to single measurements at a fixed wavelength and angle; the analysis of thin films involved \cite{}.

With the 

\subsection{Results}

\subsubsection{Application of Ellipsometry to Multilayered Sample}

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